PROJECTION EXPOSURE METHOD AND MANUFACTURING METHOD FOR DEVICE, EXPOSURE DEVICE, PROGRAM AND RECORDING MEDIUM AND EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To provide a projection exposure method capable of preventing the deterioration of an exposure accuracy resulting from a conversion into a heat of a part of the energy of exposure beams without lowering a throughput. SOLUTION: A physical quantity (such as the quantity of a base...

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1. Verfasser: KAWAKUBO SHOJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a projection exposure method capable of preventing the deterioration of an exposure accuracy resulting from a conversion into a heat of a part of the energy of exposure beams without lowering a throughput. SOLUTION: A physical quantity (such as the quantity of a base line) fluctuated in relation to the expansion and contraction of a first body generated by the absorption of exposure beams is measured in the case of a specified state (a step 457). A timing when the quantity of the base line is measured, the previously measured quantity of the base line and at least one in the corrections of a correlation between the physical quantity and the quantity of the base line are corrected and processed on the basis of the measured physical quantity (the step 459). Accordingly, since the necessity of the correction of the quantity of the base line can be decided on the basis of the observed value of the physical quantity in the case of an exposure, the quantity of the base line can be corrected at an optimum timing as compared to a conventional method. COPYRIGHT: (C)2005,JPO&NCIPI