LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To reduce delay time for a controller of a lithographic apparatus including at least two series connected integrators and an output circuit for providing output quantity of the series connected integrators to get to an operation area when the controller is in a saturation area....
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | VAN DE VEN JOHANNES THEODORUS G M DE JONGH ROBERTUS JOHANNES MARINUS MATTAAR THOMAS AUGUSTUS VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA |
| description | PROBLEM TO BE SOLVED: To reduce delay time for a controller of a lithographic apparatus including at least two series connected integrators and an output circuit for providing output quantity of the series connected integrators to get to an operation area when the controller is in a saturation area. SOLUTION: The controller includes a saturator which is coupled to the output circuit and having an operating area for passing through the output quantity and a saturation are for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area. At least one of the integrators include an amplification stage and an integrator stage which is connected to an output of the amplification stage, and a bump-less transition of amplification of the amplification stage can be achieved under control of a parameter change mechanism. COPYRIGHT: (C)2005,JPO&NCIPI |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2005045250A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2005045250A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2005045250A3</originalsourceid><addsrcrecordid>eNrjZDDz8Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1FwcQ3zdHZV8HX0C3VzdA4JDfL0c1fwdQWqd-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBqYGJqZGpgaOxkQpAgBvLChm</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>VAN DE VEN JOHANNES THEODORUS G M ; DE JONGH ROBERTUS JOHANNES MARINUS ; MATTAAR THOMAS AUGUSTUS ; VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</creator><creatorcontrib>VAN DE VEN JOHANNES THEODORUS G M ; DE JONGH ROBERTUS JOHANNES MARINUS ; MATTAAR THOMAS AUGUSTUS ; VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</creatorcontrib><description>PROBLEM TO BE SOLVED: To reduce delay time for a controller of a lithographic apparatus including at least two series connected integrators and an output circuit for providing output quantity of the series connected integrators to get to an operation area when the controller is in a saturation area. SOLUTION: The controller includes a saturator which is coupled to the output circuit and having an operating area for passing through the output quantity and a saturation are for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area. At least one of the integrators include an amplification stage and an integrator stage which is connected to an output of the amplification stage, and a bump-less transition of amplification of the amplification stage can be achieved under control of a parameter change mechanism. COPYRIGHT: (C)2005,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; HOLOGRAPHY ; MATERIALS THEREFOR ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; REGULATING ; SEMICONDUCTOR DEVICES</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050217&DB=EPODOC&CC=JP&NR=2005045250A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050217&DB=EPODOC&CC=JP&NR=2005045250A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DE VEN JOHANNES THEODORUS G M</creatorcontrib><creatorcontrib>DE JONGH ROBERTUS JOHANNES MARINUS</creatorcontrib><creatorcontrib>MATTAAR THOMAS AUGUSTUS</creatorcontrib><creatorcontrib>VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</creatorcontrib><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><description>PROBLEM TO BE SOLVED: To reduce delay time for a controller of a lithographic apparatus including at least two series connected integrators and an output circuit for providing output quantity of the series connected integrators to get to an operation area when the controller is in a saturation area. SOLUTION: The controller includes a saturator which is coupled to the output circuit and having an operating area for passing through the output quantity and a saturation are for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area. At least one of the integrators include an amplification stage and an integrator stage which is connected to an output of the amplification stage, and a bump-less transition of amplification of the amplification stage can be achieved under control of a parameter change mechanism. COPYRIGHT: (C)2005,JPO&NCIPI</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDz8Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1FwcQ3zdHZV8HX0C3VzdA4JDfL0c1fwdQWqd-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBqYGJqZGpgaOxkQpAgBvLChm</recordid><startdate>20050217</startdate><enddate>20050217</enddate><creator>VAN DE VEN JOHANNES THEODORUS G M</creator><creator>DE JONGH ROBERTUS JOHANNES MARINUS</creator><creator>MATTAAR THOMAS AUGUSTUS</creator><creator>VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</creator><scope>EVB</scope></search><sort><creationdate>20050217</creationdate><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><author>VAN DE VEN JOHANNES THEODORUS G M ; DE JONGH ROBERTUS JOHANNES MARINUS ; MATTAAR THOMAS AUGUSTUS ; VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2005045250A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DE VEN JOHANNES THEODORUS G M</creatorcontrib><creatorcontrib>DE JONGH ROBERTUS JOHANNES MARINUS</creatorcontrib><creatorcontrib>MATTAAR THOMAS AUGUSTUS</creatorcontrib><creatorcontrib>VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DE VEN JOHANNES THEODORUS G M</au><au>DE JONGH ROBERTUS JOHANNES MARINUS</au><au>MATTAAR THOMAS AUGUSTUS</au><au>VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><date>2005-02-17</date><risdate>2005</risdate><abstract>PROBLEM TO BE SOLVED: To reduce delay time for a controller of a lithographic apparatus including at least two series connected integrators and an output circuit for providing output quantity of the series connected integrators to get to an operation area when the controller is in a saturation area. SOLUTION: The controller includes a saturator which is coupled to the output circuit and having an operating area for passing through the output quantity and a saturation are for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area. At least one of the integrators include an amplification stage and an integrator stage which is connected to an output of the amplification stage, and a bump-less transition of amplification of the amplification stage can be achieved under control of a parameter change mechanism. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2005045250A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING SEMICONDUCTOR DEVICES |
| title | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T15%3A57%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VAN%20DE%20VEN%20JOHANNES%20THEODORUS%20G%20M&rft.date=2005-02-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2005045250A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |