DEFECT INSPECTION APPARATUS AND DEFECT INSPECTION METHOD

PROBLEM TO BE SOLVED: To improve both detection sensitivity and resolution without damaging an object to be inspected and without requiring any large facilities even if defects are inspected by using charged particle beams. SOLUTION: The defect inspection apparatus for inspecting defects for the obj...

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Bibliographische Detailangaben
1. Verfasser: KAWASHIMA MASAHITO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve both detection sensitivity and resolution without damaging an object to be inspected and without requiring any large facilities even if defects are inspected by using charged particle beams. SOLUTION: The defect inspection apparatus for inspecting defects for the object 1 to be inspected by detecting secondary charged particles, transmission charged particles, or transmission scattered charged particles obtained by irradiating the object 1 to be inspected with the charged particle beams 12 comprises an irradiation means for successively applying a plurality of charged particle beams 12a, 12b, 12c having different irradiation angles at each different timing; and a signal processing means for adding and computing the detection signal of the secondary charged particles, transmission charged particle, or transmission scattered charged particles obtained by the irradiation of the charged particle rays 12a, 12b, 12c. Then, the defect inspection apparatus is composed so that defects in the part to be inspected are inspected, based on the result of addition and computation by the signal processing means. COPYRIGHT: (C)2005,JPO&NCIPI