POSITIVE RADIATION-SENSITIVE POLYMER COMPOSITION, THIN FILM USING THE COMPOSITION AND ELEMENT USING THE THIN FILM

PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive polymer composition developable with an aqueous alkali solution, having high sensitivity and high resolution, and capable of forming a pattern-like thin film excellent in flatness, heat and solvent resistances and transparency. SOLUTION...

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Hauptverfasser:	MITANI SEIJU, SATO HIROYUKI, YAMAHIRO MIKIO, MOMOSE KEIICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive polymer composition developable with an aqueous alkali solution, having high sensitivity and high resolution, and capable of forming a pattern-like thin film excellent in flatness, heat and solvent resistances and transparency. SOLUTION: This positive radiation-sensitive polymer composition comprises a vinyl polymer having at least one of the constitutional units represented by formula (1) and a 1,2-quinonediazido compound, wherein R1is a single bond or a 1-3C alkylene; R2is H, methyl or Cl; R3is H or a 1-3C alkyl; X is -COO-, -OCO-, -O- or -S-; and A is an oxetane group represented by formula (a) or formula (b) wherein R4and R5are each a single bond or a 1-3C alkylene; and R6-R15are each H or a 1-3C alkyl. COPYRIGHT: (C)2005,JPO&NCIPI