TFT DISPLAY PANEL AND MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To prevent corrosion of a TFT display panel even though it is exposed to various etching conditions. SOLUTION: A gate line 121 having a gate electrode is formed on the upper part of an insulating substrate 110. Then, a gate insulating film 140, a semiconductor layer 151 and res...

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Bibliographische Detailangaben
Hauptverfasser: CHOI HEE-HWAN, SONG IN-HO, KANG HO-MIN, KIN SHOKO, KYO SEITETSU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent corrosion of a TFT display panel even though it is exposed to various etching conditions. SOLUTION: A gate line 121 having a gate electrode is formed on the upper part of an insulating substrate 110. Then, a gate insulating film 140, a semiconductor layer 151 and resistant contact layers 161, 163, 165 are formed in sequence. After that, a conductive film 177 of molybdenum series is laminated. After patterning is performed, a data line having a source electrode 173 and a drain electrode 175 is formed. Next, oxygen plasma treatment of the data line and the drain electrode 175 is performed. After forming an oxide film on the surface of the data line and the drain electrode 175, the resistant contact layers which are not covered with the data line and the drain electrode 175 are etched. Next, protective coats are laminated, patterning is performed, and a contact hole that exposes the drain electrode 175 is formed. After that, IZO is laminated on the upper part of the protective coats, patterning is performed, and a pixel electrode connected with the drain electrode 175 is formed. COPYRIGHT: (C)2005,JPO&NCIPI