SUBSTRATE PROCESSING METHOD AND APPARATUS

PROBLEM TO BE SOLVED: To provide a method capable of raising throughput by improving processing efficiency while keeping the processing capability of a substrate without increasing an installation space and without increasing a manufacturing cost and a running cost upon processing the substrate with...

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Bibliographische Detailangaben
1. Verfasser:	YOSHITANI MITSUAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method capable of raising throughput by improving processing efficiency while keeping the processing capability of a substrate without increasing an installation space and without increasing a manufacturing cost and a running cost upon processing the substrate with a processing tool. SOLUTION: When the substrate W is subjected to a predetermined processing with the processing tool 2 while carrying the substrate W, there is performed the processing of the substrate W with the processing tool 2 while moving the processing tool 2 in the same direction as a carrying direction of the substrate W at a lower speed than a carrying speed of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI