METHOD FOR PRODUCING ELECTROFORMED PRODUCT

PROBLEM TO BE SOLVED: To provide a method for producing an electroformed product by which, at the time of an LIGA (Lithographie Galvanoformung Abformung) like process using a thick film resist layer formed by a liquid type negative resist, the peeling of the resist layer is made unnecessary, and an...

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Bibliographische Detailangaben
1. Verfasser:	ONO ICHIROU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROGRAPHY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for producing an electroformed product by which, at the time of an LIGA (Lithographie Galvanoformung Abformung) like process using a thick film resist layer formed by a liquid type negative resist, the peeling of the resist layer is made unnecessary, and an electroformed product can easily be produced from a matrix pattern having a high aspect ratio. SOLUTION: An inversion pattern 40 to which a resist pattern having a high aspect ratio is transferred is produced by using a photopolymer. Thereafter, a nickel electroformed product 60 is produced by using the inversion pattern 40 formed by the photopolymer. COPYRIGHT: (C)2005,JPO&NCIPI