PLASMA SOURCE COIL FOR GENERATING PLASMA, AND PLASMA CHAMBER UTILIZING THE SAME

PROBLEM TO BE SOLVED: To provide a plasma source coil for generating plasma, and a plasma chamber using the same. SOLUTION: The plasma source coil uniformly forms plasma in a prescribed space by impressing power from a power source. The coil is constructed by making m pieces of unit coils having n t...

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Hauptverfasser:	KIN SHUNKEN, KIN NANKEN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma source coil for generating plasma, and a plasma chamber using the same. SOLUTION: The plasma source coil uniformly forms plasma in a prescribed space by impressing power from a power source. The coil is constructed by making m pieces of unit coils having n times of rotation numbers extend from a coil bushing having a prescribed radius at the center, and arranging them in a swirl-shaped circular form around the coil bushing as the center, wherein, m is an integer of not less than two, and n is a positive real number. COPYRIGHT: (C)2005,JPO&NCIPI