MATERIAL FOR REMOVING CONTAMINANT IN GAS AND METHOD FOR MANUFACTURING THE MATERIAL

PROBLEM TO BE SOLVED: To provide a contaminant removing material by which a very small amount of a gaseous chemical contaminant existing in a gas, in particular a basic gas such as ammonia in the dry gas, can be removed effectively. SOLUTION: One embodiment of this method for manufacturing the conta...

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Hauptverfasser:	HARAKAWA HIROAKI, SHIOZAWA MARI, FUJIWARA KUNIO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a contaminant removing material by which a very small amount of a gaseous chemical contaminant existing in a gas, in particular a basic gas such as ammonia in the dry gas, can be removed effectively. SOLUTION: One embodiment of this method for manufacturing the contaminant removing material comprises: a step to introduce a polymer side chain having a cation exchange group, a chelate group or a hydrophilic group onto a main chain of an organic macromolecular base material and obtain an organic macromolecular material; a step to deposit the metal ions of a metal salt on the cation exchange group, the chelate group or the hydrophilic group by bringing the metal salt into contact with the obtained organic macromolecular material; a step to oxidize the deposited metal ions and precipitate the obtained metal oxide in the form of fine particles ; and a step to treat the precipitated fine particles with an acid. COPYRIGHT: (C)2005,JPO&NCIPI