PATTERN MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING PATTERN

PROBLEM TO BE SOLVED: To provide a pattern manufacturing apparatus which can simplify a manufacturing process and reduce a manufacturing time in the process of manufacturing a pattern from a liquid material and consequently reduce a cost, and to provide a method for manufacturing the pattern. SOLUTI...

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1. Verfasser: SOGO TOMOHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a pattern manufacturing apparatus which can simplify a manufacturing process and reduce a manufacturing time in the process of manufacturing a pattern from a liquid material and consequently reduce a cost, and to provide a method for manufacturing the pattern. SOLUTION: The pattern manufacturing apparatus comprises: a self-organized film transfer section 30 to transfer a first self-organized film 50 onto a substrate 20 to form a pattern of the first self-organized film 50; and a main body 70 having a recessed part 71 corresponding to the substrate region 61 in the pattern of the self-organized film 50 of the substrate 20. A second self-organized film 74 having liquid repellency against the solvent of a liquid material 80 is deposited on the recessed part 71 of the main body 70, and the recessed part 71 holds the liquid material 80. The apparatus is also equipped with: a liquid material charging section 31 to transfer and supply the liquid material 80 held in the recessed part 71 to the substrate region 61 in the pattern of the first self-organized film 50; and a heating section 33 to dry and calcine the liquid material 80 filled into the pattern of the first self-organized film 50 of the substrate 20. COPYRIGHT: (C)2005,JPO&NCIPI