STORING VESSEL FOR PATTERN TRANSFER MASK, CLEANING DEVICE FOR PATTERN TRANSFER MASK AND WASHING METHOD THEREOF

PROBLEM TO BE SOLVED: To prevent the generation of secondary contamination such as particles, damage or the like during mask washing. SOLUTION: The storing vessel 2 for the pattern transfer mask is provided with a vessel body 10; a mask holding unit 20 installed in the vessel body 10 to hold the mas...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NOHAMA SHIYOUJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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