STORING VESSEL FOR PATTERN TRANSFER MASK, CLEANING DEVICE FOR PATTERN TRANSFER MASK AND WASHING METHOD THEREOF

PROBLEM TO BE SOLVED: To prevent the generation of secondary contamination such as particles, damage or the like during mask washing. SOLUTION: The storing vessel 2 for the pattern transfer mask is provided with a vessel body 10; a mask holding unit 20 installed in the vessel body 10 to hold the mas...

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Bibliographische Detailangaben
1. Verfasser:	NOHAMA SHIYOUJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To prevent the generation of secondary contamination such as particles, damage or the like during mask washing. SOLUTION: The storing vessel 2 for the pattern transfer mask is provided with a vessel body 10; a mask holding unit 20 installed in the vessel body 10 to hold the mask 1; and a light transmitting unit 30 provided in a predetermined region of the vessel body 10, which is opposed to the mask 1 held by the mask holding unit 20 to transmit a predetermined external light for cleaning the mask 1 held by the mask holding unit 20 by irradiating the same, while the mask 1 is cleaned by transmitting a predetermined external light through the light transmitting unit 30. COPYRIGHT: (C)2005,JPO&NCIPI