POSITION DETECTION DEVICE, EXPOSURE APPARATUS AND EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide a position detection device capable of detecting stably and highly accurately the surface position of a mask protected by a pellicle film, while suppressing the influence of a reflectivity spectral characteristic of the pellicle film. SOLUTION: This position detectio...

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Bibliographische Detailangaben
1. Verfasser:	ISHIBASHI SAYAKA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a position detection device capable of detecting stably and highly accurately the surface position of a mask protected by a pellicle film, while suppressing the influence of a reflectivity spectral characteristic of the pellicle film. SOLUTION: This position detection device for detecting the surface position of a substrate M covered by a thin film PR at an interval is equipped with an irradiation system 1-11 for irradiating the substrate surface with a detection luminous flux from across, and a detection system 12-15 for detecting photoelectrically the detection luminous flux reflected by the substrate surface and detecting the surface position of the substrate based on a photoelectric output. In the irradiation system, the substrate surface is irradiated with the detection luminous flux having a spectral characteristic corresponding to the reflectivity spectral characteristic of the thin film in order to suppress the influence caused by the thin film. COPYRIGHT: (C)2005,JPO&NCIPI