PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing ap...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SOGO TOMOHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!