PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing apparatus and a method for forming a pattern. SOLUTION: The photomask has a photocatalyst film formed by allowing photocatalyst fine particles of a specified size to fly and deposit onto at least a light-transmitting pattern region of a photomask substrate. The film is formed by electrifying the light-transmitting pattern region of the photomask substrate, electrifying the mist of a photocatalyst solution into the opposite polarity, making the mist fly to the photomask, vaporizing the solvent in the mist during flying, and depositing the photocatalyst fine particles on the light-transmitting pattern region. The apparatus is equipped with a means to produce the mist of the catalyst solution, a means to electrify the mist, and a means to electrify the entire photomask substrate or a part of the substrate into the opposite polarity to the mist, so that the photocatalyst film can be deposited in at least the light-transmitting pattern region of the photomask substrate. COPYRIGHT: (C)2005,JPO&NCIPI