PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN
PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing ap...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | SOGO TOMOHIKO |
| description | PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing apparatus and a method for forming a pattern. SOLUTION: The photomask has a photocatalyst film formed by allowing photocatalyst fine particles of a specified size to fly and deposit onto at least a light-transmitting pattern region of a photomask substrate. The film is formed by electrifying the light-transmitting pattern region of the photomask substrate, electrifying the mist of a photocatalyst solution into the opposite polarity, making the mist fly to the photomask, vaporizing the solvent in the mist during flying, and depositing the photocatalyst fine particles on the light-transmitting pattern region. The apparatus is equipped with a means to produce the mist of the catalyst solution, a means to electrify the mist, and a means to electrify the entire photomask substrate or a part of the substrate into the opposite polarity to the mist, so that the photocatalyst film can be deposited in at least the light-transmitting pattern region of the photomask substrate. COPYRIGHT: (C)2005,JPO&NCIPI |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004347717A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004347717A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004347717A3</originalsourceid><addsrcrecordid>eNrjZEgL8PAP8fd1DPbWUfAMCVbwdfQLdXN0DgkN8vRzV_B1DfHwd9FRgCtCk3cMCHAMcgwJDdZRcPRzgSpXcPMPAmFfkIoAx5AQ1yA_HgbWtMSc4lReKM3NoOTmGuLsoZtakB-fWlyQmJyal1oS7xVgZGBgYmxibm5o7mhMlCIATCU1zA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN</title><source>esp@cenet</source><creator>SOGO TOMOHIKO</creator><creatorcontrib>SOGO TOMOHIKO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing apparatus and a method for forming a pattern. SOLUTION: The photomask has a photocatalyst film formed by allowing photocatalyst fine particles of a specified size to fly and deposit onto at least a light-transmitting pattern region of a photomask substrate. The film is formed by electrifying the light-transmitting pattern region of the photomask substrate, electrifying the mist of a photocatalyst solution into the opposite polarity, making the mist fly to the photomask, vaporizing the solvent in the mist during flying, and depositing the photocatalyst fine particles on the light-transmitting pattern region. The apparatus is equipped with a means to produce the mist of the catalyst solution, a means to electrify the mist, and a means to electrify the entire photomask substrate or a part of the substrate into the opposite polarity to the mist, so that the photocatalyst film can be deposited in at least the light-transmitting pattern region of the photomask substrate. COPYRIGHT: (C)2005,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20041209&DB=EPODOC&CC=JP&NR=2004347717A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20041209&DB=EPODOC&CC=JP&NR=2004347717A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SOGO TOMOHIKO</creatorcontrib><title>PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN</title><description>PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing apparatus and a method for forming a pattern. SOLUTION: The photomask has a photocatalyst film formed by allowing photocatalyst fine particles of a specified size to fly and deposit onto at least a light-transmitting pattern region of a photomask substrate. The film is formed by electrifying the light-transmitting pattern region of the photomask substrate, electrifying the mist of a photocatalyst solution into the opposite polarity, making the mist fly to the photomask, vaporizing the solvent in the mist during flying, and depositing the photocatalyst fine particles on the light-transmitting pattern region. The apparatus is equipped with a means to produce the mist of the catalyst solution, a means to electrify the mist, and a means to electrify the entire photomask substrate or a part of the substrate into the opposite polarity to the mist, so that the photocatalyst film can be deposited in at least the light-transmitting pattern region of the photomask substrate. COPYRIGHT: (C)2005,JPO&NCIPI</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgL8PAP8fd1DPbWUfAMCVbwdfQLdXN0DgkN8vRzV_B1DfHwd9FRgCtCk3cMCHAMcgwJDdZRcPRzgSpXcPMPAmFfkIoAx5AQ1yA_HgbWtMSc4lReKM3NoOTmGuLsoZtakB-fWlyQmJyal1oS7xVgZGBgYmxibm5o7mhMlCIATCU1zA</recordid><startdate>20041209</startdate><enddate>20041209</enddate><creator>SOGO TOMOHIKO</creator><scope>EVB</scope></search><sort><creationdate>20041209</creationdate><title>PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN</title><author>SOGO TOMOHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004347717A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SOGO TOMOHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SOGO TOMOHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN</title><date>2004-12-09</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method by which the productivity can be improved by reducing the exposure time for forming a pattern, no post-treatment after exposure is required, and the pattern accuracy can be improved, and to provide a photomask manufacturing apparatus and a method for forming a pattern. SOLUTION: The photomask has a photocatalyst film formed by allowing photocatalyst fine particles of a specified size to fly and deposit onto at least a light-transmitting pattern region of a photomask substrate. The film is formed by electrifying the light-transmitting pattern region of the photomask substrate, electrifying the mist of a photocatalyst solution into the opposite polarity, making the mist fly to the photomask, vaporizing the solvent in the mist during flying, and depositing the photocatalyst fine particles on the light-transmitting pattern region. The apparatus is equipped with a means to produce the mist of the catalyst solution, a means to electrify the mist, and a means to electrify the entire photomask substrate or a part of the substrate into the opposite polarity to the mist, so that the photocatalyst film can be deposited in at least the light-transmitting pattern region of the photomask substrate. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2004347717A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | PHOTOMASK, ITS MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS, AND METHOD FOR FORMING PATTERN |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T04%3A55%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SOGO%20TOMOHIKO&rft.date=2004-12-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2004347717A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |