FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS
PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using inp...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | VAN ZON ALEX VAN RHEE TASJA CASTENMILLER THOMAS JOSEPHUS MARIA BROERS MICHAEL KOENEN WILLEM HERMAN GERTRUDA ANNA |
| description | PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using input from the level sensor. The processor (8) uses the measured height map (50) to calculate an average die structure (40), subtracts the average die structure (40) from the measured height map (50) with respect to a die (52) on the wafer to create an unworked height map (56) on the surface of the wafer, and uses the unworked height map (56) to detect an arbitrary focus spot on the surface of the wafer. COPYRIGHT: (C)2005,JPO&NCIPI |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004343060A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004343060A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004343060A3</originalsourceid><addsrcrecordid>eNrjZLBy83cODVYIDvAPUfD19_MM8Q_y9HNX8PRT8PEM8fB3D3IM8PB0VggI8vdydQ7x9PdTcAwIcAxyDAkN5mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGJsYmxgZmBo7GRCkCADURKdA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS</title><source>esp@cenet</source><creator>VAN ZON ALEX ; VAN RHEE TASJA ; CASTENMILLER THOMAS JOSEPHUS MARIA ; BROERS MICHAEL ; KOENEN WILLEM HERMAN GERTRUDA ANNA</creator><creatorcontrib>VAN ZON ALEX ; VAN RHEE TASJA ; CASTENMILLER THOMAS JOSEPHUS MARIA ; BROERS MICHAEL ; KOENEN WILLEM HERMAN GERTRUDA ANNA</creatorcontrib><description>PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using input from the level sensor. The processor (8) uses the measured height map (50) to calculate an average die structure (40), subtracts the average die structure (40) from the measured height map (50) with respect to a die (52) on the wafer to create an unworked height map (56) on the surface of the wafer, and uses the unworked height map (56) to detect an arbitrary focus spot on the surface of the wafer. COPYRIGHT: (C)2005,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20041202&DB=EPODOC&CC=JP&NR=2004343060A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20041202&DB=EPODOC&CC=JP&NR=2004343060A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN ZON ALEX</creatorcontrib><creatorcontrib>VAN RHEE TASJA</creatorcontrib><creatorcontrib>CASTENMILLER THOMAS JOSEPHUS MARIA</creatorcontrib><creatorcontrib>BROERS MICHAEL</creatorcontrib><creatorcontrib>KOENEN WILLEM HERMAN GERTRUDA ANNA</creatorcontrib><title>FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS</title><description>PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using input from the level sensor. The processor (8) uses the measured height map (50) to calculate an average die structure (40), subtracts the average die structure (40) from the measured height map (50) with respect to a die (52) on the wafer to create an unworked height map (56) on the surface of the wafer, and uses the unworked height map (56) to detect an arbitrary focus spot on the surface of the wafer. COPYRIGHT: (C)2005,JPO&NCIPI</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBy83cODVYIDvAPUfD19_MM8Q_y9HNX8PRT8PEM8fB3D3IM8PB0VggI8vdydQ7x9PdTcAwIcAxyDAkN5mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGJsYmxgZmBo7GRCkCADURKdA</recordid><startdate>20041202</startdate><enddate>20041202</enddate><creator>VAN ZON ALEX</creator><creator>VAN RHEE TASJA</creator><creator>CASTENMILLER THOMAS JOSEPHUS MARIA</creator><creator>BROERS MICHAEL</creator><creator>KOENEN WILLEM HERMAN GERTRUDA ANNA</creator><scope>EVB</scope></search><sort><creationdate>20041202</creationdate><title>FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS</title><author>VAN ZON ALEX ; VAN RHEE TASJA ; CASTENMILLER THOMAS JOSEPHUS MARIA ; BROERS MICHAEL ; KOENEN WILLEM HERMAN GERTRUDA ANNA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004343060A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN ZON ALEX</creatorcontrib><creatorcontrib>VAN RHEE TASJA</creatorcontrib><creatorcontrib>CASTENMILLER THOMAS JOSEPHUS MARIA</creatorcontrib><creatorcontrib>BROERS MICHAEL</creatorcontrib><creatorcontrib>KOENEN WILLEM HERMAN GERTRUDA ANNA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN ZON ALEX</au><au>VAN RHEE TASJA</au><au>CASTENMILLER THOMAS JOSEPHUS MARIA</au><au>BROERS MICHAEL</au><au>KOENEN WILLEM HERMAN GERTRUDA ANNA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS</title><date>2004-12-02</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using input from the level sensor. The processor (8) uses the measured height map (50) to calculate an average die structure (40), subtracts the average die structure (40) from the measured height map (50) with respect to a die (52) on the wafer to create an unworked height map (56) on the surface of the wafer, and uses the unworked height map (56) to detect an arbitrary focus spot on the surface of the wafer. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2004343060A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T06%3A11%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VAN%20ZON%20ALEX&rft.date=2004-12-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2004343060A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |