FOCUS SPOT MONITORING IN LITHOGRAPHIC PROJECTION APPARATUS

PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using inp...

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Bibliographische Detailangaben
Hauptverfasser:	VAN ZON ALEX, VAN RHEE TASJA, CASTENMILLER THOMAS JOSEPHUS MARIA, BROERS MICHAEL, KOENEN WILLEM HERMAN GERTRUDA ANNA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points. SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using input from the level sensor. The processor (8) uses the measured height map (50) to calculate an average die structure (40), subtracts the average die structure (40) from the measured height map (50) with respect to a die (52) on the wafer to create an unworked height map (56) on the surface of the wafer, and uses the unworked height map (56) to detect an arbitrary focus spot on the surface of the wafer. COPYRIGHT: (C)2005,JPO&NCIPI