DRY FLUIDIZED POLISHING METHOD

PROBLEM TO BE SOLVED: To provide a dry fluidized polishing method for improving polishing performance without increasing a rotational peripheral speed even in a conventional device scale. SOLUTION: This dry fluidized polishing method polishes a work by rubbing the polishing work and polishing media,...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TSUCHIIE KAZUYO, SUZUKI SHOICHIRO, ARITA SATORU, FUKUI YOICHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
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