PURIFYING METHOD OF HARMFUL GAS

PROBLEM TO BE SOLVED: To provide a purifying method, which can remove an amine contained in a waste gas exhausted from a semiconductor manufacturing process or the like with an excellent purifying ability, without producing newly a harmful gas such as NOx, without using a purifying apparatus having a large size or a complex constitution, and without a danger of ignition even in the case of a strong oxidative gas contained. SOLUTION: In the purifying method of the harmful gas, by contacting gas containing the amine as a noxious component with a catalyst in which a metal sulphate is carried on a mineral carrier under coexistence with air, oxygen, ozone, or oxide gas, and under heating, the harmful component contained in the gas is decomposed. COPYRIGHT: (C)2005,JPO&NCIPI