DEVICE FOR SUPPLYING GAS

PROBLEM TO BE SOLVED: To provide a device for supplying gas which is easily attachable and removable and is provided with adapters with injection nozzles having various injection forms formed thereon so that gas can be most adequately and uniformly injected to various substrates. SOLUTION: The devic...

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Bibliographische Detailangaben
Hauptverfasser:	HAN KYU-HEE, YOO SANG-WOOK, LEE SUKAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a device for supplying gas which is easily attachable and removable and is provided with adapters with injection nozzles having various injection forms formed thereon so that gas can be most adequately and uniformly injected to various substrates. SOLUTION: The device for supplying the deposition gas onto the surface of the substrate has an annular gas supply ring having a gas supply path formed to an annular form along its interior and a plurality of gas distribution paths formed in a central direction from the gas supply path and the injection nozzles communicating with the respective gas distribution paths and includes the plurality of adapters attachably and detachably coupled to the inner side of the gas supply ring. The plurality ofadapters vary in the injection forms of the injection nozzles. COPYRIGHT: (C)2005,JPO&NCIPI