POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE

PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22...

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description PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22, the replacement of a supernatant 41 and pure water 44 is repeated. COPYRIGHT: (C)2004,JPO&NCIPI
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004268193A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004268193A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004268193A3</originalsourceid><addsrcrecordid>eNrjZKgP8PfxDPbw9HNXcHEN83R21VEI9gkNCopUCHJ19g9zDUKWcXQKcgz2DHOFKtFRQGj2dQ3x8HdRcPRzQdYIFfV3Q9eqEOAYFOLp7OPKw8CalphTnMoLpbkZlNxcQ5w9dFML8uNTiwsSk1PzUkvivQKMDAxMjMwsDC2NHY2JUgQAyBg8kQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE</title><source>esp@cenet</source><creator>ABE TADAHIRO</creator><creatorcontrib>ABE TADAHIRO</creatorcontrib><description>PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22, the replacement of a supernatant 41 and pure water 44 is repeated. COPYRIGHT: (C)2004,JPO&amp;NCIPI</description><edition>7</edition><language>eng</language><subject>ADHESIVES ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; POLISHES ; POLISHING ; SEMICONDUCTOR DEVICES ; SEPARATION ; TRANSPORTING</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20040930&amp;DB=EPODOC&amp;CC=JP&amp;NR=2004268193A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20040930&amp;DB=EPODOC&amp;CC=JP&amp;NR=2004268193A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ABE TADAHIRO</creatorcontrib><title>POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE</title><description>PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22, the replacement of a supernatant 41 and pure water 44 is repeated. COPYRIGHT: (C)2004,JPO&amp;NCIPI</description><subject>ADHESIVES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgP8PfxDPbw9HNXcHEN83R21VEI9gkNCopUCHJ19g9zDUKWcXQKcgz2DHOFKtFRQGj2dQ3x8HdRcPRzQdYIFfV3Q9eqEOAYFOLp7OPKw8CalphTnMoLpbkZlNxcQ5w9dFML8uNTiwsSk1PzUkvivQKMDAxMjMwsDC2NHY2JUgQAyBg8kQ</recordid><startdate>20040930</startdate><enddate>20040930</enddate><creator>ABE TADAHIRO</creator><scope>EVB</scope></search><sort><creationdate>20040930</creationdate><title>POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE</title><author>ABE TADAHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004268193A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>ADHESIVES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ABE TADAHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ABE TADAHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE</title><date>2004-09-30</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22, the replacement of a supernatant 41 and pure water 44 is repeated. COPYRIGHT: (C)2004,JPO&amp;NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
POLISHES
POLISHING
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
title POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE
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