POLISHING DEVICE, SLURRY RECOVERING DEVICE, ABRASIVE SLURRY, POLISHING METHOD AND RECOVERING METHOD OF ABRASIVE SLURRY PARTICLE

PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22...

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Bibliographische Detailangaben
1. Verfasser:	ABE TADAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POLISHES POLISHING SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To efficiently recover an abrasive slurry particle after CMP. SOLUTION: The slurry particle 43 is composed of a magnetic material, and while precipitating the slurry particle 43 composed of the magnetic material in a waste liquid tank 21 by ON/OFF control of an electromagnet 22, the replacement of a supernatant 41 and pure water 44 is repeated. COPYRIGHT: (C)2004,JPO&NCIPI