PROJECTION ALIGNER, PROJECTION EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To improve the throughput of a work for exposing a circuit pattern while forming an unexposed part in the vicinity of the outer circumference of a circular substrate. SOLUTION: A circular masking blade 3 comprises a plate having a circular opening, and shuts off a light emitted...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KOMORIYA SUSUMU, TSURU TETSUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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