PROJECTION ALIGNER, PROJECTION EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To improve the throughput of a work for exposing a circuit pattern while forming an unexposed part in the vicinity of the outer circumference of a circular substrate. SOLUTION: A circular masking blade 3 comprises a plate having a circular opening, and shuts off a light emitted...

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Hauptverfasser:	KOMORIYA SUSUMU, TSURU TETSUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve the throughput of a work for exposing a circuit pattern while forming an unexposed part in the vicinity of the outer circumference of a circular substrate. SOLUTION: A circular masking blade 3 comprises a plate having a circular opening, and shuts off a light emitted to the vicinity of the outer circumference of a substrate 1 to form an unexposed part in the vicinity of the outer circumference of the substrate 1. When one shot is finished and the substrate 1 is stepwise moved, a controller 51 drives an XY moving mechanism 31 so as to move XY positions of the circular masking blade 3 in a way of keeping a relative position between the substrate 1 and the opening of the circular masking blade 3 constant. After the substrate 1 and the circular masking blade 3 are moved, a succeeding shot is carried out and repeating the operations above exposes the entire substrate 1. COPYRIGHT: (C)2004,JPO&NCIPI