LAMINATING SYSTEM

PROBLEM TO BE SOLVED: To enhance the lamination strength of a laminated substrate. SOLUTION: In the laminating system of wafer, surface state of first and second substrates is measured by a measuring device in a chamber 201 isolated from the external space. Based on the measurements, surface of the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YAMAGATA KENJI, YANAGIDA KAZUTAKA
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator YAMAGATA KENJI
YANAGIDA KAZUTAKA
description PROBLEM TO BE SOLVED: To enhance the lamination strength of a laminated substrate. SOLUTION: In the laminating system of wafer, surface state of first and second substrates is measured by a measuring device in a chamber 201 isolated from the external space. Based on the measurements, surface of the first and second substrates is cleaned by a processing unit and then the first and second substrates are overlaid. The chamber isolates an operating unit for overlaying the substrates, the surface measuring device and the processing unit from the external space. COPYRIGHT: (C)2004,JPO&NCIPI
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004266071A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004266071A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004266071A3</originalsourceid><addsrcrecordid>eNrjZBD0cfT19HMM8fRzVwiODA5x9eVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBiZGZmYG5oaOxkQpAgBkiR5N</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LAMINATING SYSTEM</title><source>esp@cenet</source><creator>YAMAGATA KENJI ; YANAGIDA KAZUTAKA</creator><creatorcontrib>YAMAGATA KENJI ; YANAGIDA KAZUTAKA</creatorcontrib><description>PROBLEM TO BE SOLVED: To enhance the lamination strength of a laminated substrate. SOLUTION: In the laminating system of wafer, surface state of first and second substrates is measured by a measuring device in a chamber 201 isolated from the external space. Based on the measurements, surface of the first and second substrates is cleaned by a processing unit and then the first and second substrates are overlaid. The chamber isolates an operating unit for overlaying the substrates, the surface measuring device and the processing unit from the external space. COPYRIGHT: (C)2004,JPO&amp;NCIPI</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20040924&amp;DB=EPODOC&amp;CC=JP&amp;NR=2004266071A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20040924&amp;DB=EPODOC&amp;CC=JP&amp;NR=2004266071A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMAGATA KENJI</creatorcontrib><creatorcontrib>YANAGIDA KAZUTAKA</creatorcontrib><title>LAMINATING SYSTEM</title><description>PROBLEM TO BE SOLVED: To enhance the lamination strength of a laminated substrate. SOLUTION: In the laminating system of wafer, surface state of first and second substrates is measured by a measuring device in a chamber 201 isolated from the external space. Based on the measurements, surface of the first and second substrates is cleaned by a processing unit and then the first and second substrates are overlaid. The chamber isolates an operating unit for overlaying the substrates, the surface measuring device and the processing unit from the external space. COPYRIGHT: (C)2004,JPO&amp;NCIPI</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBD0cfT19HMM8fRzVwiODA5x9eVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBiZGZmYG5oaOxkQpAgBkiR5N</recordid><startdate>20040924</startdate><enddate>20040924</enddate><creator>YAMAGATA KENJI</creator><creator>YANAGIDA KAZUTAKA</creator><scope>EVB</scope></search><sort><creationdate>20040924</creationdate><title>LAMINATING SYSTEM</title><author>YAMAGATA KENJI ; YANAGIDA KAZUTAKA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004266071A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMAGATA KENJI</creatorcontrib><creatorcontrib>YANAGIDA KAZUTAKA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMAGATA KENJI</au><au>YANAGIDA KAZUTAKA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LAMINATING SYSTEM</title><date>2004-09-24</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To enhance the lamination strength of a laminated substrate. SOLUTION: In the laminating system of wafer, surface state of first and second substrates is measured by a measuring device in a chamber 201 isolated from the external space. Based on the measurements, surface of the first and second substrates is cleaned by a processing unit and then the first and second substrates are overlaid. The chamber isolates an operating unit for overlaying the substrates, the surface measuring device and the processing unit from the external space. COPYRIGHT: (C)2004,JPO&amp;NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2004266071A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title LAMINATING SYSTEM
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T19%3A56%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YAMAGATA%20KENJI&rft.date=2004-09-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2004266071A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true