DEFECT INSPECTION METHOD AND APPARATUS THEREFOR, AND PRETREATMENT METHOD FOR EXPOSURE MASK

PROBLEM TO BE SOLVED: To provide an inexpensive and high efficiency surface defect inspection method which can easily be applied for an article to be inspected having both of a pattern region and a non-pattern region, and to provide an apparatus therefor, and a pretreatment method for an exposure mask. SOLUTION: The exposure pattern region 2 is intentionally eliminated from the object of defect inspection, while the defect inspection is carried out in the unexposed pattern region 3 so that the defect information in the exposed pattern region 2 is detected based on the defect information in the unexposed pattern region 3. The defect inspection in the exposed pattern region 2 is difficult and less efficient because the defect and the pattern have to be distinguished from each other. On the other hand, the defect inspection in the unexposed pattern region 3 is easy and efficient because it is not required to distinguish the defect from the pattern. The defect inspection is carried out by irradiating the region with laser light 9 (or an electron beam can be used) and measuring scattered light 11 by foreign matter or the like. The data converted into electric signals is inputted into a defect number operation unit 14 where the number and size of the defect are judged or processing such as eliminating the data in the exposure pattern region 2 is carried out. COPYRIGHT: (C)2004,JPO&NCIPI