METHOD FOR MANUFACTURING THIN FILM OF PHOTOCATALYTIC ANATASE TYPE TITANIUM DIOXIDE

PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film of an anatase type titanium dioxide, which film contains only an anatase phase with highly photocatalytic activity and superior adhesiveness to a substrate, formed by a laser vapor-deposition film-forming method, and to provide...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAMOTO HARUYA, SAI EIKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film of an anatase type titanium dioxide, which film contains only an anatase phase with highly photocatalytic activity and superior adhesiveness to a substrate, formed by a laser vapor-deposition film-forming method, and to provide the method being further economical by using a glass substrate. SOLUTION: The method for manufacturing the thin film of the anatase type titanium dioxide on the substrate of silica glass by the laser vapor-deposition film-forming method, is characterized by employing the sintered compact of titanium carbide as a target and the substrate of silica glass as a substrate, and irradiating a target with a laser beam under an oxygen atmosphere of 30 mTorr at a substrate temperature of 450 to 550°C to manufacture the titanium dioxide thin film containing only the anatase phase with the highly photocatalytic activity. COPYRIGHT: (C)2004,JPO&NCIPI