EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an exposure apparatus in which an exposure region and a mask pattern are excellently aligned over the entire exposure region of a thin plate having a photoresist formed on its surface when the mask pattern is transferred by irradiation of light onto the surface of the thin plate. SOLUTION: Holes 1a, 1b are formed in the exposure region of a thin plate 1, while marks 2a, 2b are formed in the mask 2. When the gravity center of the holes 1a, 1b coincides with the gravity center of the marks 2a, 2b and the holes 1a, 1b and the marks 2a, 2b are aligned on a single straight line, a completely aligned state of the exposure region and the mask pattern is realized. When this state is not obtained, first, positional shifts between the hole 1a and the mark 2a and between the hole 1b and the mark 2b are measured by a CCD camera, and the shift in each of four corners of the exposure region is calculated from the measured shifts between the marks. After the thin plate 1 and the mask are adjusted for alignment in such a manner that the shift in the lateral direction of the plate, the shift in the longitudinal direction and the distance of misaligned positions of each of the four corners are within specified values, the plate is exposed. COPYRIGHT: (C)2004,JPO&NCIPI