METHOD FOR GENERATING PLASMA

PROBLEM TO BE SOLVED: To provide a method for generating plasma which generates a plasma with reliability at low cost. SOLUTION: The method for generating plasma comprises: a step for preparing a plasma generating apparatus 1, where the plasma generating apparatus 1 includes a power supply electrode...

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Bibliographische Detailangaben
Hauptverfasser:	SUGIYAMA AKIRA, MURAKAMI KOJI, YOSHIMOTO SHOZO, HAYASHI HIDEKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS PLASMA TECHNIQUE PREVENTION OF FOULING IN GENERAL PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for generating plasma which generates a plasma with reliability at low cost. SOLUTION: The method for generating plasma comprises: a step for preparing a plasma generating apparatus 1, where the plasma generating apparatus 1 includes a power supply electrode 11 having a first end 11t, a grounding electrode 13 being located at a position separated from the power supply electrode 11 and having a second end portion 13t, an insulator 12a provided between the power supply electrode 11 and the grounding electrode, a stage 19 as a supporting member to support a substrate 18 and to be mounted so as to face the first and second end portions 11t and 13t, and a covering dielectric material 112 covering the first and the second ends 11t and 13t; and a step for generating a plasma 17 by applying a potential difference between the power supply electrode 11 and the grounding electrode 13, and by supplying a mixed gas of air and an inert gas of 30 vol.% between the first and the second ends 11t and 13t and the stage 19. COPYRIGHT: (C)2004,JPO&NCIPI