MANUFACTURING METHOD OF LITHOGRAPHIC PLATE

PROBLEM TO BE SOLVED: To provide a manufacturing method of a lithographic plate which is excellent in carrying properties in an exposure device, facilitates regulation of a register in the initial stage of printing and brings about no elongation of a machine plate due to impression. SOLUTION: After...

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Bibliographische Detailangaben
1. Verfasser:	SHIMONODAN SATOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a manufacturing method of a lithographic plate which is excellent in carrying properties in an exposure device, facilitates regulation of a register in the initial stage of printing and brings about no elongation of a machine plate due to impression. SOLUTION: After a plate making processing of the lithographic plate, solid fine particulates having an average particle diameter of 1-100 μm are given to the rear side of the lithographic plate. COPYRIGHT: (C)2004,JPO&NCIPI