LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND SUBSTRATE HOLDER

PROBLEM TO BE SOLVED: To provide a substrate holder which can clamp a concave substrate more securely. SOLUTION: A substrate holder 10 has burls 12 having a height of 100 μm or less and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the su...

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Bibliographische Detailangaben
Hauptverfasser:	OTTENS JOOST JEROEN, VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS, MEIJERS PIETER J G, VAN NUNEN GERARDUS P M, CUIJPERS MARTINUS AGNES WILLEM
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a substrate holder which can clamp a concave substrate more securely. SOLUTION: A substrate holder 10 has burls 12 having a height of 100 μm or less and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thus, a concave wafer W' can be securely clamped by generating an initial vacuum in the central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen so that the wafer is fully clamped. COPYRIGHT: (C)2004,JPO&NCIPI