PHOTORESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a photoresist composition for a MMN (Multi Micro Nozzle) coater which contains a novolak resin having molecular weight of 2,000 to 12,000 and a diazide photosensitive agent, in which furtherance and content of an organic solvent and a Si series surfactant are adjuste...

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Bibliographische Detailangaben
Hauptverfasser:	RI TOKI, SHU SHINGO, RI YUKYO, KYO SEITETSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photoresist composition for a MMN (Multi Micro Nozzle) coater which contains a novolak resin having molecular weight of 2,000 to 12,000 and a diazide photosensitive agent, in which furtherance and content of an organic solvent and a Si series surfactant are adjusted and which is used for a circuit of a liquid crystal display. SOLUTION: The photoresist composition for the circuit of the liquid crystal display can solves a problem of unevenness appeared in the MMN coater being applicable to a large-sized substrate glass, can improve coating characteristic, can be easily applied to a real industrial site and has large effect in improvement of productivity and yield. COPYRIGHT: (C)2004,JPO&NCIPI