LITHOGRAPHY EQUIPMENT, MIRROR ELEMENTS, METHOD TO MANUFACTURE DEVICES AND BEAM DELIVERY SYSTEM

PROBLEM TO BE SOLVED: To provide a photolithography equipment that can maximize a kinetic energy output, while keeping the cost and reconstruction down to the minimum. SOLUTION: According to this invention, lithography equipment is provided which comprises a radiation system that provides radiation projection beams, a supporting structure to support a pattern formation means that forms patterns in projection beans in accordance with the desired pattern, a substrate table to hold a substrate, a projection system to project the beams on the target location of the substrate after the pattern formation, a lighting system to provide the radiation beams after the beams have been adjusted so that the pattern formation means may be illuminated, a beam delivery system equipped with direction change elements that enable the direction change and delivery of the projection beams from the radiation system to the lighting system. The radiation beams are structured so that they may have the stated polarizing status, while the direction change elements are structured so that the radiation beam loss may be minimized against the stated polarizing status of the radiation beams. COPYRIGHT: (C)2004,JPO&NCIPI