METHOD AND APPARATUS FOR PELLICLE FRAME HAVING POROUS FILTER INSERTION BODY AND PROTRUDING BONDING FACE

PROBLEM TO BE SOLVED: To provide an apparatus and a method for purging oxygen in the air gap between a reticle and pellicle so as to prevent absorption of radiation by oxygen in photolithographic processes, the radiation containing a component at the wavelength to be absorbed by oxygen. SOLUTION: A...

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Bibliographische Detailangaben
Hauptverfasser:	IVALDI JORGE, LUO FLORENCE, LAGANZA JOSEPH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an apparatus and a method for purging oxygen in the air gap between a reticle and pellicle so as to prevent absorption of radiation by oxygen in photolithographic processes, the radiation containing a component at the wavelength to be absorbed by oxygen. SOLUTION: A frame 206 defining first and second opposing faces is disposed, and the first opposing face 320 defines a first opening and is configured to mate with a pellicle and the second opposing face 322 defines a second opening and is configured to mate a reticle in such a manner that the surround of the optical gap 112 between the pellicle 108 and the reticle 104 is surrounded. At least one edge of the frame has an opening penetrating through the edge. A porous sintered material is disposed to fill the opening in at least one edge of the frame so as to purge the optical gap. COPYRIGHT: (C)2004,JPO&NCIPI