SUPPORTING MEANS, STAGE SYSTEM AND EXPOSURE DEVICE

PROBLEM TO BE SOLVED: To provide a supporting means preventing the reflection surface of a reflection mirror from being deformed even when a difference exists between the linear expansion coefficients of the reflection mirror and a structural body. SOLUTION: The supporting means 10 supporting the re...

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Bibliographische Detailangaben
Hauptverfasser:	KUBOTA YASUHITO, KAWAMURA HIDEJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a supporting means preventing the reflection surface of a reflection mirror from being deformed even when a difference exists between the linear expansion coefficients of the reflection mirror and a structural body. SOLUTION: The supporting means 10 supporting the reflection mirror 5 where a Y-axis direction is set as a longitudinal direction on the structural body 50 is equipped with a fixed part 11 fixing the position A of the mirror 5 in the Y-axis direction with respect to the structural body 50, and supporting parts 12 and 13 supporting the positions B and C of the mirror 5 in the Y-axis direction so as to move in the Y-axis direction with respect to the structural body 50. COPYRIGHT: (C)2004,JPO&NCIPI