TRANSFER MASK BLANK, TRANSFER MASK, AND TRANSFER METHOD USING THE SAME

PROBLEM TO BE SOLVED: To attain an efficient production of a transfer mask for charged corpuscular rays including electron beams, a transfer mask for X-rays and a transfer mask for extreme ultraviolet rays by means of an existing device such as an electron beam drawing device for photomasks with improved accuracy in processing mask patterns. SOLUTION: The transfer mask and a transfer mask blank therefor are arranged such that a substrate 2 is profiled to have a substantially rectangular parallelepiped shape; an opening 3 is provided at approximately a center portion of a lower surface of the substrate 2; a self-supporting thin film m is supported at approximately a center portion of an upper surface of the substrate 2 corresponding to the opening 3 to provide a pattern region 4, a through-holes h, or absorbers or scatterers for the mask patterns are provided at the self-supporting thin film m; and the pattern region 4 and a region 5 around the pattern region 4 are in the same plane. COPYRIGHT: (C)2004,JPO&NCIPI