DEFOAMING DISPERSANT FOR PHOTORESIST DEVELOPER SOLUTIONS

PROBLEM TO BE SOLVED: To provide a defoaming dispersant for a resist developer solution, the dispersant having excellent defoaming property for foams in a developer solution and excellent dispersibility of scum produced in the developer solution in a developing process of a photoresist using the developer solution. SOLUTION: The defoaming dispersant for a photoresist developer solution contains a partial fatty acid ester obtained by allowing a mixture fatty acid having the proportion of 5 to 300 parts by mass of 6-14C middle fatty acid with respect to 100 parts by mass of ≥15C higher fatty acid to react with an aliphatic trihydric alcohol. The obtained defoaming dispersant for a resist developer solution has high defoaming property for a developer solution even when a resist component dissolved or dispersed in the developer solution increases during developing the resist, as well as has excellent dispersibility with the scum produced in the developer solution, and thereby, the dispersant can prevent the scum from depositing on the resist or the substrate. COPYRIGHT: (C)2004,JPO