PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide a reflection type reduced projection optical system which is reduced in size. SOLUTION: From the reticle side, six mirrors are so arranged as to reflect light, in the order of a concave-type first mirror (M1), second mirror (M2), concave type third mirror (M3), conve...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	OSAKI YUMIKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a reflection type reduced projection optical system which is reduced in size. SOLUTION: From the reticle side, six mirrors are so arranged as to reflect light, in the order of a concave-type first mirror (M1), second mirror (M2), concave type third mirror (M3), convex type fourth mirror (M4), convex type fifth mirror (M5), and concave type sixth mirror (M6). An intermediate image is formed between the third mirror (M3) and the fifth mirror (M5). Among the six mirrors, at least one is an aspherical mirror. The numerical aperture NA on the image side is larger than 0.2, and the effective diameter of all six mirrors is 500 mm or smaller. COPYRIGHT: (C)2004,JPO