LIQUID EVALUATION DEVICE
PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device com...
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| creator | MIZUNIWA TETSUO |
| description | PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device comprises a silicon single crystal electrode, a control electrode, and a device for measuring a potential generated between the two electrodes when they are immersed in a sample liquid, as main components. COPYRIGHT: (C)2004,JPO |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004152992A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004152992A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004152992A3</originalsourceid><addsrcrecordid>eNrjZJDw8QwM9XRRcA1z9Al1DPH091NwcQ3zdHblYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYmhqZGlpZGjsZEKQIAMhogJw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LIQUID EVALUATION DEVICE</title><source>esp@cenet</source><creator>MIZUNIWA TETSUO</creator><creatorcontrib>MIZUNIWA TETSUO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device comprises a silicon single crystal electrode, a control electrode, and a device for measuring a potential generated between the two electrodes when they are immersed in a sample liquid, as main components. COPYRIGHT: (C)2004,JPO</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040527&DB=EPODOC&CC=JP&NR=2004152992A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040527&DB=EPODOC&CC=JP&NR=2004152992A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIZUNIWA TETSUO</creatorcontrib><title>LIQUID EVALUATION DEVICE</title><description>PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device comprises a silicon single crystal electrode, a control electrode, and a device for measuring a potential generated between the two electrodes when they are immersed in a sample liquid, as main components. COPYRIGHT: (C)2004,JPO</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDw8QwM9XRRcA1z9Al1DPH091NwcQ3zdHblYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYmhqZGlpZGjsZEKQIAMhogJw</recordid><startdate>20040527</startdate><enddate>20040527</enddate><creator>MIZUNIWA TETSUO</creator><scope>EVB</scope></search><sort><creationdate>20040527</creationdate><title>LIQUID EVALUATION DEVICE</title><author>MIZUNIWA TETSUO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004152992A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MIZUNIWA TETSUO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIZUNIWA TETSUO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LIQUID EVALUATION DEVICE</title><date>2004-05-27</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device comprises a silicon single crystal electrode, a control electrode, and a device for measuring a potential generated between the two electrodes when they are immersed in a sample liquid, as main components. COPYRIGHT: (C)2004,JPO</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | LIQUID EVALUATION DEVICE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T19%3A59%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MIZUNIWA%20TETSUO&rft.date=2004-05-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2004152992A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |