LIQUID EVALUATION DEVICE

PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device com...

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1. Verfasser: MIZUNIWA TETSUO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a device for evaluating a washing and an etching performance of a liquid, such as super-pure water and a washing chemical, in contact with a silicon wafer, with respect to the silicon wafer, easily in a short period of time. SOLUTION: The liquid evaluation device comprises a silicon single crystal electrode, a control electrode, and a device for measuring a potential generated between the two electrodes when they are immersed in a sample liquid, as main components. COPYRIGHT: (C)2004,JPO