METHOD OF FORMING MICROELECTRONIC PATTERN BY FORMING MIXED LAYER OF WATER-SOLUBLE RESIN AND RESIST MATERIAL

PROBLEM TO BE SOLVED: To provide a method of forming a microelectronic pattern by forming a mixed layer of a water-soluble resin and a resist material. SOLUTION: The resist pattern containing the resist material is formed on a microelectronic substrate. A coating layer containing the water-soluble r...

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Bibliographische Detailangaben
Hauptverfasser:	SIHYEUNG-LEE, CHOI SANG-JUN, KIM HYOUNGDO, WOOSUNG-HAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of forming a microelectronic pattern by forming a mixed layer of a water-soluble resin and a resist material. SOLUTION: The resist pattern containing the resist material is formed on a microelectronic substrate. A coating layer containing the water-soluble resin capable of mutually mixing with the resist material is formed on the resist pattern to provide the mixed layer containing the resist material and the water-soluble resin between the resist pattern and a non-mixed coating layer. The mixed layer is cured, and the non-mixed coating layer is removed from the cured mixed layer. COPYRIGHT: (C)2004,JPO