SUBSTRATE PROCESSING APPARATUS AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can process a substrate for wafer, etc., while high cleanliness is maintained and to provide a method of processing the same. SOLUTION: The substrate processing apparatus includes a center port 100 disposed fixedly at a center a...

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Bibliographische Detailangaben
Hauptverfasser:	TAKEDA KAZUYASU, ISHIZAKI TADASHI, WATARI TORU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BEARINGS BLASTING CLEANING CLEANING IN GENERAL CYLINDERS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELEMENTS OR CRANKSHAFT MECHANISMS ENGINEERING ELEMENTS AND UNITS FLEXIBLE SHAFTS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PISTONS PREVENTION OF FOULING IN GENERAL ROTARY BODIES OTHER THAN GEARING ELEMENTS SEALINGS SEMICONDUCTOR DEVICES SHAFTS THERMAL INSULATION IN GENERAL TRANSPORTING WEAPONS
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