METHOD FOR MANUFACTURING PROTECTIVE FILM

PROBLEM TO BE SOLVED: To manufacture a protective film at low temperatures with no damage by a plasma CVD method on an element. SOLUTION: A protective film is manufactured by using a vacuum ultraviolet rays CVD device 100 which has a vacuum ultraviolet rays generation part 102, a reaction chamber 10...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MOTOYAMA RIICHI, MIYANO JUNICHI, SAIKAWA KIYOHIKO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To manufacture a protective film at low temperatures with no damage by a plasma CVD method on an element. SOLUTION: A protective film is manufactured by using a vacuum ultraviolet rays CVD device 100 which has a vacuum ultraviolet rays generation part 102, a reaction chamber 106 provided with a support tray 114 for supporting a substrate 116, and a window 104 for separating the reaction chamber 106 from the vacuum ultraviolet rays generator 102. In manufacturing, a temperature of the substrate 116 is held at the low temperature by a heat insulater 118 provided in the support tray 114, while an organic based material gas is supplied from a gas supply 112 to the inside of the reaction chamber 106, and also vacuum ultraviolet rays are irradiated from the vacuum ultraviolet rays generator 102 through the window 104. COPYRIGHT: (C)2004,JPO