SUBSTRATE CONVEYING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

PROBLEM TO BE SOLVED: To provide a substrate conveying apparatus in which decrease in the quality of the substrate is suppressed by preventing the substrate and conveying rollers from being charged in an apparatus for conveying the substrate with the rollers, and to provide a substrate processing sy...

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Bibliographische Detailangaben
Hauptverfasser: TANAKA SATORU, NAKAMURA TSUGIO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate conveying apparatus in which decrease in the quality of the substrate is suppressed by preventing the substrate and conveying rollers from being charged in an apparatus for conveying the substrate with the rollers, and to provide a substrate processing system having such a substrate conveying apparatus. SOLUTION: An inlet conveying unit 2 has a plurality of the conveying rollers 22 and a liquid supply unit 6. The rollers 22 have a plurality of rolls 20, and the liquid supply unit 6 supplies an antistatic liquid to the rolls 20. Thus, a static electricity generated between the rollers 22 and the substrate is prevented. Even if the rollers 22 are charged, the rollers 22 are neutralized by an antistatic liquid L brought into contact with the rollers 22, and hence a decrease in a treating quality of the substrate can be prevented. COPYRIGHT: (C)2004,JPO