REFLECTIVELY BACKED PHOTOSENSITIVE ELEMENT

PROBLEM TO BE SOLVED: To provide a reflectively backed photosensitive element which reduces small defects, enhances production yield in patterning process and in subsequent process of the reflectively backed photosensitive resin layer, and improves reliability of parts. SOLUTION: In the reflectively...

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Bibliographische Detailangaben
Hauptverfasser:	IGARASHI YOSHIZO, FURUBAYASHI HIROMI, MUKAI IKUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a reflectively backed photosensitive element which reduces small defects, enhances production yield in patterning process and in subsequent process of the reflectively backed photosensitive resin layer, and improves reliability of parts. SOLUTION: In the reflectively backed photosensitive element obtained by successively stacking (a) a ruggedness forming layer support film, (b) a reflectively backed photosensitive resin layer and (c) a protective film, the protective film (c) consists essentially of acrylic polymer. COPYRIGHT: (C)2004,JPO