TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS

PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-d...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: MIYAGI SACHIKO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator MIYAGI SACHIKO
description PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004099570A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004099570A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004099570A3</originalsourceid><addsrcrecordid>eNrjZNAMcQ0JcvSIdAnyD4gMcvSL9HEMcXVRCPD3ifQLdfZxdQxSCPBw9fP3CeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBiYGlpam5gaOxkQpAgDEjiWG</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><source>esp@cenet</source><creator>MIYAGI SACHIKO</creator><creatorcontrib>MIYAGI SACHIKO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HETEROCYCLIC COMPOUNDS ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20040402&amp;DB=EPODOC&amp;CC=JP&amp;NR=2004099570A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20040402&amp;DB=EPODOC&amp;CC=JP&amp;NR=2004099570A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAGI SACHIKO</creatorcontrib><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><description>PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAMcQ0JcvSIdAnyD4gMcvSL9HEMcXVRCPD3ifQLdfZxdQxSCPBw9fP3CeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBiYGlpam5gaOxkQpAgDEjiWG</recordid><startdate>20040402</startdate><enddate>20040402</enddate><creator>MIYAGI SACHIKO</creator><scope>EVB</scope></search><sort><creationdate>20040402</creationdate><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><author>MIYAGI SACHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004099570A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAGI SACHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAGI SACHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><date>2004-04-02</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2004099570A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T10%3A49%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MIYAGI%20SACHIKO&rft.date=2004-04-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2004099570A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true