TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS
PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-d...
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creator | MIYAGI SACHIKO |
description | PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2004099570A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2004099570A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2004099570A3</originalsourceid><addsrcrecordid>eNrjZNAMcQ0JcvSIdAnyD4gMcvSL9HEMcXVRCPD3ifQLdfZxdQxSCPBw9fP3CeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBiYGlpam5gaOxkQpAgDEjiWG</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><source>esp@cenet</source><creator>MIYAGI SACHIKO</creator><creatorcontrib>MIYAGI SACHIKO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HETEROCYCLIC COMPOUNDS ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040402&DB=EPODOC&CC=JP&NR=2004099570A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040402&DB=EPODOC&CC=JP&NR=2004099570A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAGI SACHIKO</creatorcontrib><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><description>PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAMcQ0JcvSIdAnyD4gMcvSL9HEMcXVRCPD3ifQLdfZxdQxSCPBw9fP3CeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBiYGlpam5gaOxkQpAgDEjiWG</recordid><startdate>20040402</startdate><enddate>20040402</enddate><creator>MIYAGI SACHIKO</creator><scope>EVB</scope></search><sort><creationdate>20040402</creationdate><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><author>MIYAGI SACHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2004099570A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAGI SACHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAGI SACHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS</title><date>2004-04-02</date><risdate>2004</risdate><abstract>PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS |
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