TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS

TETRAHYDROPYRANYLATED POLYNUCLEAR PHENOLS

PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-d...

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Bibliographische Detailangaben
1. Verfasser: MIYAGI SACHIKO
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a new tetrahydropyranylated polynuclear phenol usable as a photo-sensitizer, a dissolution suppressing agent, etc., of a photo-sensitive resin composition. SOLUTION: The new tetrahydropyranylated polynuclear phenol produced by reacting a polynuclear phenol with 3,4-dihydro-2H-pyran is expressed e.g. by general formula (VI) (R groups are each independently H or tetrahydropyranyl group provided that at least one of the four R groups is tetrahydropyranyl group). COPYRIGHT: (C)2004,JPO