DEPOSITION SYSTEM AND DEPOSITION METHOD FOR ANTIREFLECTION FILM

PROBLEM TO BE SOLVED: To reduce the film birefringence of antireflection films deposited on substrates for liquid crystal devices. SOLUTION: The deposition system has a vapor deposition source for evaporating a material to be deposited by evaporation including components for deposition of the antireflection films and a freely rotatable and revolvable holding means for installing and holding the substrates for the liquid crystal devices to a spherical surface shape so as to oppose their surfaces to the vapor deposition source and deposits the antireflection films on the surfaces of the substrates by vacuum evaporating the material to be deposited by evaporation which is evaporated by the vapor deposition source to the surfaces of the substrates. The vapor deposition source is installed on the rotating and revolving shaft of the holding means and the substrates are installed at the maximum 10° or below with respect to the surface orthogonal with the rotating and revolving shaft. COPYRIGHT: (C)2004,JPO