WASHING METHOD FOR INSIDE OF HIGH PURITY CHEMICAL FEED APPARATUS AND HIGH PURITY CHEMICAL FEED APPARATUS
PROBLEM TO BE SOLVED: To provide a washing method for the inside of a high purity chemical feed apparatus capable of easily washing even a large sized device or the like and causing no problem of contamination, and to provide a high purity chemical feed apparatus. SOLUTION: The high purity chemical...
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| creator | ICHISHITA JUNGO KAWAJIRI KOJI TAKIZAWA SHIRO |
| description | PROBLEM TO BE SOLVED: To provide a washing method for the inside of a high purity chemical feed apparatus capable of easily washing even a large sized device or the like and causing no problem of contamination, and to provide a high purity chemical feed apparatus. SOLUTION: The high purity chemical feed apparatus is provided with a vessel body 1 made of a stainless steel of which an inner surface is subjected to electrolytic polishing; and a lid part 2 joined to the vessel body. When the inner surface of the high purity chemical feed apparatus provided with a high purity chemical pouring means 3 for pouring the high purity chemical into the vessel body 1 and a high purity chemical feed means 4 for taking out the high purity chemical from the vessel body 1 is washed, a washing liquid is sprayed to the inner surfaces of the vessel body 1 and the lid part 2 by a washing liquid spraying means 5 provided on the high purity chemical feed apparatus 10. COPYRIGHT: (C)2004,JPO |
| format | Patent |
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SOLUTION: The high purity chemical feed apparatus is provided with a vessel body 1 made of a stainless steel of which an inner surface is subjected to electrolytic polishing; and a lid part 2 joined to the vessel body. When the inner surface of the high purity chemical feed apparatus provided with a high purity chemical pouring means 3 for pouring the high purity chemical into the vessel body 1 and a high purity chemical feed means 4 for taking out the high purity chemical from the vessel body 1 is washed, a washing liquid is sprayed to the inner surfaces of the vessel body 1 and the lid part 2 by a washing liquid spraying means 5 provided on the high purity chemical feed apparatus 10. COPYRIGHT: (C)2004,JPO</description><edition>7</edition><language>eng</language><subject>CLEANING ; CLEANING IN GENERAL ; COFFEE MILLS ; DOMESTIC ARTICLES OR APPLIANCES ; DOMESTIC WASHING OR CLEANING ; FURNITURE ; HUMAN NECESSITIES ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SPICE MILLS ; SUCTION CLEANERS IN GENERAL ; TRANSPORTING</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040325&DB=EPODOC&CC=JP&NR=2004089865A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040325&DB=EPODOC&CC=JP&NR=2004089865A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ICHISHITA JUNGO</creatorcontrib><creatorcontrib>KAWAJIRI KOJI</creatorcontrib><creatorcontrib>TAKIZAWA SHIRO</creatorcontrib><title>WASHING METHOD FOR INSIDE OF HIGH PURITY CHEMICAL FEED APPARATUS AND HIGH PURITY CHEMICAL FEED APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide a washing method for the inside of a high purity chemical feed apparatus capable of easily washing even a large sized device or the like and causing no problem of contamination, and to provide a high purity chemical feed apparatus. SOLUTION: The high purity chemical feed apparatus is provided with a vessel body 1 made of a stainless steel of which an inner surface is subjected to electrolytic polishing; and a lid part 2 joined to the vessel body. When the inner surface of the high purity chemical feed apparatus provided with a high purity chemical pouring means 3 for pouring the high purity chemical into the vessel body 1 and a high purity chemical feed means 4 for taking out the high purity chemical from the vessel body 1 is washed, a washing liquid is sprayed to the inner surfaces of the vessel body 1 and the lid part 2 by a washing liquid spraying means 5 provided on the high purity chemical feed apparatus 10. 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SOLUTION: The high purity chemical feed apparatus is provided with a vessel body 1 made of a stainless steel of which an inner surface is subjected to electrolytic polishing; and a lid part 2 joined to the vessel body. When the inner surface of the high purity chemical feed apparatus provided with a high purity chemical pouring means 3 for pouring the high purity chemical into the vessel body 1 and a high purity chemical feed means 4 for taking out the high purity chemical from the vessel body 1 is washed, a washing liquid is sprayed to the inner surfaces of the vessel body 1 and the lid part 2 by a washing liquid spraying means 5 provided on the high purity chemical feed apparatus 10. COPYRIGHT: (C)2004,JPO</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | CLEANING CLEANING IN GENERAL COFFEE MILLS DOMESTIC ARTICLES OR APPLIANCES DOMESTIC WASHING OR CLEANING FURNITURE HUMAN NECESSITIES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SPICE MILLS SUCTION CLEANERS IN GENERAL TRANSPORTING |
| title | WASHING METHOD FOR INSIDE OF HIGH PURITY CHEMICAL FEED APPARATUS AND HIGH PURITY CHEMICAL FEED APPARATUS |
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